Pascal and Francis Bibliographic Databases

Help

Search results

Your search

kw.\*:("Via hole")

Document Type [dt]

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Publication Year[py]

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Discipline (document) [di]

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Language

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Author Country

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Results 1 to 25 of 875

  • Page / 35
Export

Selection :

  • and

Impact of Illumination on Model -Based SRAF Placement for Contact PatterningSTURTEVANT, John L; JAYARAM, Srividya; EL-SEWEFY, Omar et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 764036.1-764036.6, 2Conference Paper

Diblock copolymer directed self- assembly for CMOS device fabricationCHANG, Li-Wen; WONG, H.-S. Philip.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 615611.1-615611.6, issn 0277-786X, isbn 0-8194-6199-7, 1VolConference Paper

Error factor in bottom CD measurement for contact hole using CD-SEMABE, Hideaki; YAMAZAKI, Yuichiro.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6195-4, 2Vol, vol 2, 61524H.1-61524H.9Conference Paper

Copy result exactly using EB-scope technologyYARAADA, Keizo; USHIKI, Takeo; ITAGAKI, Yousuke et al.SPIE proceedings series. 2003, pp 21-30, isbn 0-8194-4846-X, 10 p.Conference Paper

Reliability evaluation of high Density microvia structuresJOSHI, Jaydutt; MARQUEZ, Ursula; PRIMAVERA, Anthony et al.SPIE proceedings series. 2002, pp 249-254, isbn 0-930815-65-3Conference Paper

A novel Resist material for sub-100nm contact hole patternCHUNG, Jeong-Hee; CHOI, Sang-Jun; YOOL KANG et al.SPIE proceedings series. 2000, pp 305-312, isbn 0-8194-3617-8Conference Paper

The influence of topographical variations on reliable via and contact formationHEALEY, J. T; RUBEL, S.SPIE proceedings series. 1998, pp 131-145, isbn 0-8194-2966-XConference Paper

Micronetworking: reliable communication on 3D integrated circuitsCONTRERAS, A. A; MOON, T. K; DASU, A et al.Electronics letters. 2010, Vol 46, Num 4, pp 291-293, issn 0013-5194, 3 p.Article

Conformal mapping in microlithographyKLATCHKO, Asher; PIROGOVSKY, Peter.SPIE proceedings series. 2004, pp 291-300, isbn 0-8194-5513-X, 2Vol, 10 p.Conference Paper

Frequency behavior of ground plane via interconnections in multilayer LTCC-modulesTHELEMANN, T; THUST, H.SPIE proceedings series. 1997, pp 350-355, isbn 0-930815-50-5Conference Paper

Study of Devices Leakage of 45nm node with Different SRAM Layouts Using an Advanced e-beam Inspection SystemsHONG XIAO; LONG MA; YAN ZHAO et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 72721E.1-72721E.10, 2Conference Paper

Advanced microlithography process with chemical shrink technologyKANDA, Takashi; TANAKA, Hatsuyuki; KINOSHITA, Yoshiaki et al.SPIE proceedings series. 2000, pp 881-889, isbn 0-8194-3617-8Conference Paper

TSV constraints related to temperature excursion, pressure during molding, materials used and handling loadsFATAT, Tomasz; FRIEDEL, Kazimierz; MARENCO, Norman et al.Microsystem technologies. 2009, Vol 15, Num 1, pp 181-190, issn 0946-7076, 10 p.Article

Study of Through-Silicon-Via Impact on the 3-D Stacked IC LayoutDAE HYUN KIM; ATHIKULWONGSE, Krit; SUNG KYU LIM et al.IEEE transactions on very large scale integration (VLSI) systems. 2013, Vol 21, Num 5, pp 862-874, issn 1063-8210, 13 p.Article

Wire-bonded through-silicon vias with low capacitive substrate couplingFISCHER, A. C; GRANGE, M; ROXHED, N et al.Journal of micromechanics and microengineering (Print). 2011, Vol 21, Num 8, issn 0960-1317, 085035.1-085035.8Article

Development of novel UV cross-linkable materials for enhancing planarity in via applications via the correlation of simulated and experimental analysesTAKEI, Satoshi; LIN, Michael W; YOON, Sangwoong et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 72730W.1-72730W.5, 2Conference Paper

Driving Contact Hole Resolution to 45nm using Novel Process Enhancement TechniquesMONTGOMERY, W; BENNETT, S; HULI, L et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692339.1-692339.9, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Mask optimization for arbitrary patterns with 2D-TCC resolution enhancement techniqueKAWASHIMA, Miyoko; YAMAZOE, Kenji; SEKINE, Yoshiyuki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69240F.1-69240F.12, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper

Toward the integration of a single carbon nanofibre as via interconnectCOIFFIC, J. C; LE POCHE, H; MARIOLLE, D et al.Microelectronic engineering. 2008, Vol 85, Num 10, pp 1971-1974, issn 0167-9317, 4 p.Conference Paper

Proximity effect correction for the chemical shrink process of different type contact holesWEI HSIEN HSIEH; HUNG JEN LIU; WEN BIN WU et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65193E.1-65193E.6, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

DOF enhancement for contact holes by using Nikon's CDP option and its introduction into productionARMELLIN, Louis-Pierre; DUREUIL, Virginie; NUEL, Laurent et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6197-0, vol 2, 61542B.1-61542B.10Conference Paper

New concept of high-k integration in MOSFET's by a deposition through contact holesHARRISON, S; CORONEL, P; WACQUANT, F et al.Microelectronic engineering. 2004, Vol 72, Num 1-4, pp 321-325, issn 0167-9317, 5 p.Conference Paper

Defocusing image to pattern contact holes using attenuated phase shift masksSINGH, Navab; MUKHERJEE-ROY, Moitreyee; SOHAN SINGH MEHTA et al.Microelectronics journal. 2003, Vol 34, Num 4, pp 237-245, issn 0959-8324, 9 p.Article

Recent lithographic results from LEEPLMORIYA, Shigeru.SPIE proceedings series. 2003, pp 864-870, isbn 0-8194-4996-2, 7 p.Conference Paper

Effect of via etching process and postclean treatment on via electrical performanceCHIEW NYUK HO; YEOW KHENG LIM; GERALD, Higelin et al.Journal of electronic materials. 2001, Vol 30, Num 12, pp 1595-1601, issn 0361-5235Conference Paper

  • Page / 35